Invention Grant
- Patent Title: Electrode structure and semiconductor device
- Patent Title (中): 电极结构和半导体器件
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Application No.: US12307228Application Date: 2008-04-04
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Publication No.: US08154129B2Publication Date: 2012-04-10
- Inventor: Kikuo Okada , Kojiro Kameyama , Takahiro Oikawa
- Applicant: Kikuo Okada , Kojiro Kameyama , Takahiro Oikawa
- Applicant Address: JP Gunma US AZ Phoenix
- Assignee: SANYO Semiconductor Co., Ltd.,Semiconductor Components Industries, LLC
- Current Assignee: SANYO Semiconductor Co., Ltd.,Semiconductor Components Industries, LLC
- Current Assignee Address: JP Gunma US AZ Phoenix
- Agency: Morrison & Foerster LLP
- Priority: JP2007-100838 20070406
- International Application: PCT/JP2008/057127 WO 20080404
- International Announcement: WO2008/126914 WO 20081023
- Main IPC: H01L23/492
- IPC: H01L23/492

Abstract:
In a power MOS transistor, for example, a source electrode is formed so as to be commonly connected to a plurality of source regions formed on the front surface. Thus, a current density varies based on in-plane resistance of the source electrode, thereby providing the necessity of increasing the number of wires connecting the sources and a lead. In the invention, an electrode structure includes a copper plating layer 10e formed on a pad electrode 10a by an electrolytic plating method, and a nickel plating layer 10f and a gold plating layer formed so as to cover the upper and side surfaces of the copper plating layer 10e by an electroless plating method.
Public/Granted literature
- US20090315175A1 ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE Public/Granted day:2009-12-24
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