Invention Grant
- Patent Title: Optical apparatus for defect inspection
- Patent Title (中): 用于缺陷检查的光学设备
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Application No.: US12850300Application Date: 2010-08-04
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Publication No.: US08154717B2Publication Date: 2012-04-10
- Inventor: Seiji Otani , Koichi Nagoya
- Applicant: Seiji Otani , Koichi Nagoya
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-180639 20060630
- Main IPC: G01N21/88
- IPC: G01N21/88

Abstract:
An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
Public/Granted literature
- US20100315626A1 OPTICAL APPARATUS FOR DEFECT INSPECTION Public/Granted day:2010-12-16
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