Invention Grant
- Patent Title: RF power supply
- Patent Title (中): 射频电源
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Application No.: US12178414Application Date: 2008-07-23
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Publication No.: US08154897B2Publication Date: 2012-04-10
- Inventor: Michael Glueck , Alex Miller , Erich Pivit
- Applicant: Michael Glueck , Alex Miller , Erich Pivit
- Applicant Address: DE Freiburg
- Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee Address: DE Freiburg
- Agency: Fish & Richardson P.C.
- Priority: WOPCT/EP2008/002657 20080403
- Main IPC: H02M7/537
- IPC: H02M7/537

Abstract:
An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network.
Public/Granted literature
- US20090027936A1 RF POWER SUPPLY Public/Granted day:2009-01-29
Information query
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