Invention Grant
- Patent Title: Nitride semiconductor laser device and method of manufacturing the same
- Patent Title (中): 氮化物半导体激光器件及其制造方法
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Application No.: US12982677Application Date: 2010-12-30
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Publication No.: US08155162B2Publication Date: 2012-04-10
- Inventor: Shinichi Kohda , Yuji Ishida
- Applicant: Shinichi Kohda , Yuji Ishida
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, P.C.
- Priority: JP2007-340212 20071228
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S3/13 ; H01S3/08

Abstract:
A nitride semiconductor laser device is formed by growing a group III nitride semiconductor multilayer structure on a substrate. The group III nitride semiconductor multilayer structure has a laser resonator including an n-type semiconductor layer, a p-type semiconductor layer and a light emitting layer held between the n-type semiconductor layer and the p-type semiconductor layer. The laser resonator is arranged to be offset from the center with respect to a device width direction orthogonal to a resonator direction toward one side edge of the device. A wire bonding region having a width of not less than twice the diameter of an electrode wire to be bonded to the device is formed between the laser resonator and the other side edge of the device.
Public/Granted literature
- US20110096805A1 NITRIDE SEMICONDUCTOR LASER DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-04-28
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