Invention Grant
- Patent Title: Method for fabrication of low-polarization implantable stimulation electrode
- Patent Title (中): 低极化可植入刺激电极的制造方法
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Application No.: US11042649Application Date: 2005-01-25
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Publication No.: US08155754B2Publication Date: 2012-04-10
- Inventor: Lea A. Nygren , James A. Coles, Jr. , Scott J. Brabec , Randy G. Rose
- Applicant: Lea A. Nygren , James A. Coles, Jr. , Scott J. Brabec , Randy G. Rose
- Applicant Address: US MN Minneapolis
- Assignee: Medtronic, Inc.
- Current Assignee: Medtronic, Inc.
- Current Assignee Address: US MN Minneapolis
- Agent Carol F. Barry
- Main IPC: A61N1/04
- IPC: A61N1/04

Abstract:
A method for fabricating an implantable medical electrode includes roughening the electrode substrate, applying an adhesion layer, and depositing a valve metal oxide coating over the adhesion layer under conditions optimized to minimize electrode impedance and post-pulse polarization. The electrode substrate may be a variety of electrode metals or alloys including titanium, platinum, platinum-iridium, or niobium. The adhesion layer may be formed of titanium or zirconium. The valve metal oxide coating is a ruthenium oxide coating sputtered onto the adhesion layer under controlled target power, sputtering pressure, and sputter gas ratio setting optimized to minimize electrode impedance and post-pulse polarization.
Public/Granted literature
- US20060167536A1 Method for fabrication of low-polarization implantable stimulation electrode Public/Granted day:2006-07-27
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