Invention Grant
- Patent Title: Method and system for mask optimization
- Patent Title (中): 面罩优化的方法和系统
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Application No.: US11612422Application Date: 2006-12-18
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Publication No.: US08156450B2Publication Date: 2012-04-10
- Inventor: Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
- Applicant: Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.
Public/Granted literature
- US20080148216A1 METHOD AND SYSTEM FOR MASK OPTIMIZATION Public/Granted day:2008-06-19
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