Invention Grant
US08158542B2 SiO2 slurry for the production of quartz glass as well as the application of the slurry
有权
用于生产石英玻璃的SiO2浆料以及浆料的应用
- Patent Title: SiO2 slurry for the production of quartz glass as well as the application of the slurry
- Patent Title (中): 用于生产石英玻璃的SiO2浆料以及浆料的应用
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Application No.: US12311446Application Date: 2007-09-12
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Publication No.: US08158542B2Publication Date: 2012-04-17
- Inventor: Waltraud Werdecker , Norbert Traeger , Juergen Weber
- Applicant: Waltraud Werdecker , Norbert Traeger , Juergen Weber
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Tiajoloff & Kelly LLP
- Priority: DE102006046619 20060929
- International Application: PCT/EP2007/059565 WO 20070912
- International Announcement: WO2008/040615 WO 20080410
- Main IPC: C03C3/076
- IPC: C03C3/076

Abstract:
A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm in the range 0.2-15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83%-90%.
Public/Granted literature
- US20090266110A1 SiO slurry for the production of quartz glass as well as the application of the slurry Public/Granted day:2009-10-29
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