Invention Grant
US08161985B2 Method and apparatus for cleaning articles used in the production of semiconductors
有权
用于清洁半导体生产中使用的制品的方法和装置
- Patent Title: Method and apparatus for cleaning articles used in the production of semiconductors
- Patent Title (中): 用于清洁半导体生产中使用的制品的方法和装置
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Application No.: US11247622Application Date: 2005-10-10
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Publication No.: US08161985B2Publication Date: 2012-04-24
- Inventor: Thomas J. Moran , Lutz Rebstock
- Applicant: Thomas J. Moran , Lutz Rebstock
- Applicant Address: DE Radolfzell
- Assignee: Dynamic Microsystems Semiconductor Equipment GmbH
- Current Assignee: Dynamic Microsystems Semiconductor Equipment GmbH
- Current Assignee Address: DE Radolfzell
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: DE10317275 20030411; DE10347464 20031002
- Main IPC: B08B3/00
- IPC: B08B3/00
Abstract:
An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.
Public/Granted literature
- US20060185692A1 Method and apparatus for cleaning articles used in the production of semiconductors Public/Granted day:2006-08-24
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