Invention Grant
- Patent Title: Underlayer coating forming composition for lithography containing polysilane compound
- Patent Title (中): 用于含聚硅烷化合物的光刻用底层涂料组合物
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Application No.: US11920840Application Date: 2006-05-12
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Publication No.: US08163460B2Publication Date: 2012-04-24
- Inventor: Satoshi Takei , Keisuke Hashimoto , Makoto Nakajima
- Applicant: Satoshi Takei , Keisuke Hashimoto , Makoto Nakajima
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-150420 20050524
- International Application: PCT/JP2006/309576 WO 20060512
- International Announcement: WO2006/126406 WO 20061130
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/075 ; G03F7/26
Abstract:
There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer coating.The composition comprises a polysilane compound, a crosslinkable compound, a crosslinking catalyst and a solvent. The polysilane compound is preferably a polysilane compound having a bond between silicons at the main chain.
Public/Granted literature
- US20080318158A1 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound Public/Granted day:2008-12-25
Information query
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