Invention Grant
US08163463B2 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
有权
光刻胶组合物,使用光致抗蚀剂组合物和喷墨打印头形成图案的方法
- Patent Title: Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
- Patent Title (中): 光刻胶组合物,使用光致抗蚀剂组合物和喷墨打印头形成图案的方法
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Application No.: US12040009Application Date: 2008-02-29
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Publication No.: US08163463B2Publication Date: 2012-04-24
- Inventor: Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
- Applicant: Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Stanzione & Kim, LLP
- Priority: KR10-2007-0079170 20070807
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/30 ; B41J2/05 ; B41J2/16

Abstract:
A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
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