Invention Grant
US08163469B2 Coating and developing apparatus, coating and developing method, and storage medium
有权
涂装和显影设备,涂层和显影方法以及存储介质
- Patent Title: Coating and developing apparatus, coating and developing method, and storage medium
- Patent Title (中): 涂装和显影设备,涂层和显影方法以及存储介质
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Application No.: US12659134Application Date: 2010-02-26
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Publication No.: US08163469B2Publication Date: 2012-04-24
- Inventor: Kouichi Hontake , Hideharu Kyouda
- Applicant: Kouichi Hontake , Hideharu Kyouda
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2009-061657 20090313
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G03C5/56 ; G03C11/00

Abstract:
A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water repellent treatment on a side surface of a substrate; and a control unit controlling operations of the modules to execute steps of performing water repellent treatment at least on a side surface portion of a substrate and performing a first resist coating on an entire surface of the substrate; performing a first development after a first liquid-immersion exposure is performed; performing a second resist coating on the entire surface, and performing a second development after a second liquid-immersion exposure is performed, and further to execute a step of performing water repellent treatment on the side surface portion of the substrate after the first development and before the second exposure is performed.
Public/Granted literature
- US20100232781A1 Coating and developing apparatus, coating and developing method, and storage medium Public/Granted day:2010-09-16
Information query
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