Invention Grant
US08164077B2 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
有权
用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统
- Patent Title: Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
- Patent Title (中): 用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统
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Application No.: US12625336Application Date: 2009-11-24
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Publication No.: US08164077B2Publication Date: 2012-04-24
- Inventor: Marco Wedowski , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
- Applicant: Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Main IPC: G01J3/10
- IPC: G01J3/10

Abstract:
An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
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