Invention Grant
US08164231B2 Electret device comprising electret film formed on main surface of substrate and electrostatic operating apparatus
有权
驻极体装置包括在基板的主表面上形成的驻极体膜和静电操作装置
- Patent Title: Electret device comprising electret film formed on main surface of substrate and electrostatic operating apparatus
- Patent Title (中): 驻极体装置包括在基板的主表面上形成的驻极体膜和静电操作装置
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Application No.: US11936542Application Date: 2007-11-07
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Publication No.: US08164231B2Publication Date: 2012-04-24
- Inventor: Katsuji Mabuchi
- Applicant: Katsuji Mabuchi
- Applicant Address: JP Osaka
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2006-305615 20061110; JP2007-268195 20071015
- Main IPC: H02N1/00
- IPC: H02N1/00
Abstract:
An electret device includes a substrate formed with a plurality of recess portions on a main surface thereof and an electret film so formed on the main surface of the substrate as to cover at least inner surfaces of the recess portions.
Public/Granted literature
- US20080111444A1 ELECTRET DEVICE AND ELECTROSTATIC OPERATING APPARATUS Public/Granted day:2008-05-15
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