Invention Grant
US08164247B2 Electron emitting element, electron emitting device, light emitting device, image display device, air blowing device, cooling device, charging device, image forming apparatus, and electron-beam curing device
有权
电子发射元件,电子发射器件,发光器件,图像显示装置,送风装置,冷却装置,充电装置,成像装置和电子束固化装置
- Patent Title: Electron emitting element, electron emitting device, light emitting device, image display device, air blowing device, cooling device, charging device, image forming apparatus, and electron-beam curing device
- Patent Title (中): 电子发射元件,电子发射器件,发光器件,图像显示装置,送风装置,冷却装置,充电装置,成像装置和电子束固化装置
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Application No.: US12782102Application Date: 2010-05-18
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Publication No.: US08164247B2Publication Date: 2012-04-24
- Inventor: Hiroyuki Hirakawa , Ayae Nagaoka , Yasuo Imura , Tadashi Iwamatsu
- Applicant: Hiroyuki Hirakawa , Ayae Nagaoka , Yasuo Imura , Tadashi Iwamatsu
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2009-121460 20090519
- Main IPC: H01J17/49
- IPC: H01J17/49

Abstract:
The present invention provides an electron emitting element which has good energy efficiency and which is capable of controlling a value of current flowing in an electron acceleration layer and an amount of emitted electrons by adjusting a resistance value of the electron acceleration layer and an amount of generated ballistic electrons. An electron emitting element 1 includes an electron acceleration layer 4 including a fine particle layer containing insulating fine particles. In the electron emitting element 1, Ie=α·R−0.67 where Ie [A/cm2] is electron emission current per unit area during the voltage application and R is element resistance [Ω·cm2] per unit area, the element resistance being obtained by dividing (a) a voltage applied between the electrode substrate 2 and the thin-film electrode 3 during the voltage application by (b) current in element per unit area which current flows between the electrode substrate 2 and the thin-film electrode 3 during the voltage application, and where α is not less than 2.0×10−6, and the electron emission current Ie is not less than 1.0×10−9.
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