Invention Grant
- Patent Title: Emissive device having a layer that relieves external forces on adjacent layer, process for producing the emissive device and an electronic apparatus including the emissive device
- Patent Title (中): 发射装置具有减轻相邻层上的外力的层，用于制造发射装置的处理和包括发射装置的电子装置
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Application No.: US11557386Application Date: 2006-11-07
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Publication No.: US08164258B2Publication Date: 2012-04-24
- Inventor: Kenji Hayashi , Yukio Yamauchi
- Applicant: Kenji Hayashi , Yukio Yamauchi
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-354359 20051208
- Main IPC: H01L51/52
- IPC: H01L51/52
Abstract:
An emissive device includes a substrate; a plurality of first electrodes; pixel banks having a plurality of openings each corresponding to the position of a corresponding one of the first electrodes; organic function layers disposed in at least the openings; a second electrode disposed so as to cover the pixel banks and the organic function layers; a first inorganic layer disposed over the second electrode; a second inorganic layer disposed over the first inorganic layer; an organic buffer layer disposed over the second inorganic layer; and a gas barrier layer disposed over the organic buffer layer.
Public/Granted literature
- US20070132381A1 EMISSIVE DEVICE, PROCESS FOR PRODUCING EMISSIVE DEVICE, AND ELECTRONIC APPARATUS Public/Granted day:2007-06-14
Information query
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