Invention Grant
US08164349B2 Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
有权
用于检测等离子体处理室中的撞击步骤的电容耦合静电(CCE)探针装置及其方法
- Patent Title: Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
- Patent Title (中): 用于检测等离子体处理室中的撞击步骤的电容耦合静电(CCE)探针装置及其方法
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Application No.: US12498936Application Date: 2009-07-07
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Publication No.: US08164349B2Publication Date: 2012-04-24
- Inventor: Jean-Paul Booth , Douglas L. Keil
- Applicant: Jean-Paul Booth , Douglas L. Keil
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: IPSG, P.C., Intellectual Property Law
- Main IPC: G01R27/26
- IPC: G01R27/26 ; G01R31/08

Abstract:
A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists.
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