Invention Grant
- Patent Title: MEMS device and method for manufacturing the same
- Patent Title (中): MEMS器件及其制造方法
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Application No.: US12436374Application Date: 2009-05-06
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Publication No.: US08166827B2Publication Date: 2012-05-01
- Inventor: Yuichi Miyoshi , Tohru Yamaoka , Hidenori Notake , Yusuke Takeuchi
- Applicant: Yuichi Miyoshi , Tohru Yamaoka , Hidenori Notake , Yusuke Takeuchi
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-232628 20080910
- Main IPC: G01L9/06
- IPC: G01L9/06
Abstract:
A MEMS device, including: a substrate having a first principal plane and a second principal plane opposite to the first principal plane; a through hole formed in the substrate; and a vibrating film formed over the first principal plane so as to cover the through hole. The first principal plane and the second principal plane are both a (110) crystal face; and the through hole has a substantially rhombic shape on the second principal plane.
Public/Granted literature
- US20100059836A1 MEMS DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-03-11
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