Invention Grant
- Patent Title: Slicing method
- Patent Title (中): 切片方法
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Application No.: US12310652Application Date: 2007-08-22
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Publication No.: US08167681B2Publication Date: 2012-05-01
- Inventor: Hiroshi Oishi , Daisuke Nakamata
- Applicant: Hiroshi Oishi , Daisuke Nakamata
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2006-257380 20060922
- International Application: PCT/JP2007/066227 WO 20070822
- International Announcement: WO2008/035529 WO 20080327
- Main IPC: B24B49/00
- IPC: B24B49/00

Abstract:
The present invention provides a slicing method comprising winding a wire around a plurality of grooved rollers and pressing the wire against an ingot to be sliced into wafers while supplying a slurry for slicing to the grooved rollers and causing the wire to travel, wherein a supply temperature of the slurry for slicing is controlled, and slicing is performed in such a manner that the supply temperature of the slurry for slicing and a temperature of the ingot become at least 30° C. or above at end of slicing the ingot. As a result, there is provided the slicing method that can alleviate precipitous cooling of an ingot in the time close to end of slicing the ingot and thereby suppress production of a nano-topography when slicing the ingot by using a wire saw.
Public/Granted literature
- US20100037881A1 Slicing method Public/Granted day:2010-02-18
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