Invention Grant
US08168269B2 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
失效
等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
- Patent Title: Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
- Patent Title (中): 等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
-
Application No.: US12883889Application Date: 2010-09-16
-
Publication No.: US08168269B2Publication Date: 2012-05-01
- Inventor: Mahreeyee Mahajani , Joseph Yudovsky , Brendon McDougall
- Applicant: Mahreeyee Mahajani , Joseph Yudovsky , Brendon McDougall
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H05H1/24
- IPC: H05H1/24 ; C23C16/00
Abstract:
A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.
Public/Granted literature
- US20110000433A1 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL Public/Granted day:2011-01-06
Information query
IPC分类:
