Invention Grant
US08168354B2 Photosensitive composition, partition walls, color filter and organic EL device
有权
光敏组合物,隔墙,滤色片和有机EL器件
- Patent Title: Photosensitive composition, partition walls, color filter and organic EL device
- Patent Title (中): 光敏组合物,隔墙,滤色片和有机EL器件
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Application No.: US12971032Application Date: 2010-12-17
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Publication No.: US08168354B2Publication Date: 2012-05-01
- Inventor: Hideyuki Takahashi , Kenji Ishizeki
- Applicant: Hideyuki Takahashi , Kenji Ishizeki
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-174974 20080703
- Main IPC: G03F7/038
- IPC: G03F7/038

Abstract:
It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula: —CFXRf (1) or a group represented by the formula: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and a weight average molecular weight of at least 5×104 and at most 25×104.
Public/Granted literature
- US20110143282A1 PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, COLOR FILTER AND ORGANIC EL DEVICE Public/Granted day:2011-06-16
Information query
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