Invention Grant
- Patent Title: Positive photosensitive resin composition
- Patent Title (中): 正型感光性树脂组合物
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Application No.: US12449022Application Date: 2008-01-18
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Publication No.: US08168371B2Publication Date: 2012-05-01
- Inventor: Tadashi Hatanaka
- Applicant: Tadashi Hatanaka
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-011414 20070122
- International Application: PCT/JP2008/050644 WO 20080118
- International Announcement: WO2008/090827 WO 20080731
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004
Abstract:
It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition.
Public/Granted literature
- US20100028805A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION Public/Granted day:2010-02-04
Information query
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