Invention Grant
- Patent Title: Carbon nanotube high frequency transistor technology
- Patent Title (中): 碳纳米管高频晶体管技术
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Application No.: US11966693Application Date: 2007-12-28
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Publication No.: US08168495B1Publication Date: 2012-05-01
- Inventor: Brian Y. Lim , Jon W. Lai
- Applicant: Brian Y. Lim , Jon W. Lai
- Applicant Address: US CA Pasadena
- Assignee: Etamota Corporation
- Current Assignee: Etamota Corporation
- Current Assignee Address: US CA Pasadena
- Agency: Aka Chan LLP
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
A technique of the invention reduces significantly the distance between the gate and single-walled carbon nanotubes to improve performance and efficiency of a carbon nanotube transistor device. Without using a porous template structure, single-walled carbon nanotubes are grown perpendicularly to a substrate between a base metal layer and a middle mesh layer. The nanotubes are insulated with a thin insulator and then gate regions are formed.
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