Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12328207Application Date: 2008-12-04
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Publication No.: US08169052B2Publication Date: 2012-05-01
- Inventor: Hirofumi Harada
- Applicant: Hirofumi Harada
- Applicant Address: JP Chiba-Shi, Chiba
- Assignee: Seiko Instruments Inc.
- Current Assignee: Seiko Instruments Inc.
- Current Assignee Address: JP Chiba-Shi, Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2007-326022 20071218
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
A metal electrode is disposed on each of a plurality of resistor groups which are made of polycrystalline silicon resistors and constitute a resistor circuit. The metal electrode is connected to an end of the resistor via another interconnecting layer. Accordingly, the external influence which the metal electrode receives during a semiconductor manufacturing process is prevented from directly acting on the resistor, whereby resistance variation is suppressed.
Public/Granted literature
- US20090152679A1 SEMICONDUCTOR DEVICE Public/Granted day:2009-06-18
Information query
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