Invention Grant
- Patent Title: Semiconductor memory cell, method for manufacturing the same and method for operating the same
- Patent Title (中): 半导体存储单元及其制造方法及其操作方法
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Application No.: US12641223Application Date: 2009-12-17
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Publication No.: US08169828B2Publication Date: 2012-05-01
- Inventor: Jin-Hyo Jung
- Applicant: Jin-Hyo Jung
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2008-0136820 20081230
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A semiconductor memory cell, and method of manufacturing a semiconductor memory cell and an method of operating a semiconductor memory cell. A method of operating may include programming a semiconductor memory cell by applying a preset programming voltage to a common source and/or an N-well region, grounding and/or floating a control gate, and/or grounding a word line and/or a bit line. A method of operating may include erasing a semiconductor memory cell by floating and/or grounding a word line, applying a preset erase voltage to a control gate, and/or grounding an N-well, a bit line and/or a common source. A method of operating may include reading a semiconductor memory cell by grounding and/or floating a control gate, applying a preset read voltage to an N-well and/or a common source, grounding a word line, and/or applying a preset drain voltage to a bit line.
Public/Granted literature
- US20100165746A1 SEMICONDUCTOR MEMORY CELL, METHOD FOR MANUFACTURING THE SAME AND METHOD FOR OPERATING THE SAME Public/Granted day:2010-07-01
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