Invention Grant
US08169828B2 Semiconductor memory cell, method for manufacturing the same and method for operating the same 有权
半导体存储单元及其制造方法及其操作方法

  • Patent Title: Semiconductor memory cell, method for manufacturing the same and method for operating the same
  • Patent Title (中): 半导体存储单元及其制造方法及其操作方法
  • Application No.: US12641223
    Application Date: 2009-12-17
  • Publication No.: US08169828B2
    Publication Date: 2012-05-01
  • Inventor: Jin-Hyo Jung
  • Applicant: Jin-Hyo Jung
  • Applicant Address: KR Seoul
  • Assignee: Dongbu HiTek Co., Ltd.
  • Current Assignee: Dongbu HiTek Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: Sherr & Vaughn, PLLC
  • Priority: KR10-2008-0136820 20081230
  • Main IPC: G11C16/04
  • IPC: G11C16/04
Semiconductor memory cell, method for manufacturing the same and method for operating the same
Abstract:
A semiconductor memory cell, and method of manufacturing a semiconductor memory cell and an method of operating a semiconductor memory cell. A method of operating may include programming a semiconductor memory cell by applying a preset programming voltage to a common source and/or an N-well region, grounding and/or floating a control gate, and/or grounding a word line and/or a bit line. A method of operating may include erasing a semiconductor memory cell by floating and/or grounding a word line, applying a preset erase voltage to a control gate, and/or grounding an N-well, a bit line and/or a common source. A method of operating may include reading a semiconductor memory cell by grounding and/or floating a control gate, applying a preset read voltage to an N-well and/or a common source, grounding a word line, and/or applying a preset drain voltage to a bit line.
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