Invention Grant
- Patent Title: Method for detecting surface defects in patterned media
- Patent Title (中): 用于检测图案化介质中表面缺陷的方法
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Application No.: US12715891Application Date: 2010-03-02
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Publication No.: US08169868B2Publication Date: 2012-05-01
- Inventor: Ayumu Ishihara
- Applicant: Ayumu Ishihara
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2009-076230 20090326
- Main IPC: G11B20/18
- IPC: G11B20/18

Abstract:
An optical defect detection method for patterned media includes: irradiating a laser beam onto a patterned medium and obtaining reflected light by reflection very close to a sample; outputting the reflected light as an analog electrical signal from an optical receiver; converting the analog signal to a digital signal; obtaining a surface profile in a track direction by sampling the analog signal; obtaining a servo area profile by setting a slice for detecting servo area; calculating an average value in a track width direction based on plural servo area profiles; generating a master servo area profile based on the average value; obtaining a difference between the master servo area profile and the specific servo area profile; and detecting the presence of a defect including surface roughness, process fluctuation, and adhesion of foreign matters, from a differential waveform.
Public/Granted literature
- US20100246357A1 METHOD FOR DETECTING SURFACE DEFECTS IN PATTERNED MEDIA Public/Granted day:2010-09-30
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