Invention Grant
US08172635B2 Alignment device and method for aligning apertures in different plates
有权
用于对准不同板上的孔的对准装置和方法
- Patent Title: Alignment device and method for aligning apertures in different plates
- Patent Title (中): 用于对准不同板上的孔的对准装置和方法
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Application No.: US11330225Application Date: 2006-01-12
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Publication No.: US08172635B2Publication Date: 2012-05-08
- Inventor: Jiunn-Nan Lin , Ruey-Yong Deng
- Applicant: Jiunn-Nan Lin , Ruey-Yong Deng
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01J9/00
- IPC: H01J9/00

Abstract:
An alignment device for aligning a second aperture in a second plate with a first aperture in a first plate and an alignment method of utilizing the same. The alignment device includes a main body, a first part extending from the main body, and a second part extending from the first part. The main body comprises a first linear dimension exceeding a width of the second aperture for disposing overlying the second plate. The first part comprises a second linear dimension for extending and fitting into the second aperture. The second part comprises a third linear dimension for extending and fitting into the first aperture.
Public/Granted literature
- US20070161320A1 Alignment device and method for aligning apertures in different plates Public/Granted day:2007-07-12
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