Invention Grant
- Patent Title: Polishing system having a track
- Patent Title (中): 具有轨道的抛光系统
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Application No.: US12420996Application Date: 2009-04-09
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Publication No.: US08172643B2Publication Date: 2012-05-08
- Inventor: Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
- Applicant: Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B24B49/00
- IPC: B24B49/00 ; B24B5/00

Abstract:
Embodiments described herein relate to a track system in a polishing system. One embodiment described herein provides a track system configured to transfer polishing heads in a polishing system. The track system comprises a supporting frame, a track coupled to the supporting frame and defining a path along which the polishing heads are configured to move, and one or more carriages configured to carry at least one polishing head along the path defined by the track, wherein the one or more carriages are coupled to the track and independently movable along the track.
Public/Granted literature
- US20090258574A1 POLISHING SYSTEM HAVING A TRACK Public/Granted day:2009-10-15
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