Invention Grant
US08172923B2 Apparatus and method for reducing particle contamination in a vacuum chamber
有权
用于减少真空室中的颗粒污染的装置和方法
- Patent Title: Apparatus and method for reducing particle contamination in a vacuum chamber
- Patent Title (中): 用于减少真空室中的颗粒污染的装置和方法
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Application No.: US12356818Application Date: 2009-01-21
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Publication No.: US08172923B2Publication Date: 2012-05-08
- Inventor: Christopher Vroman , Marshall Randolph
- Applicant: Christopher Vroman , Marshall Randolph
- Applicant Address: US MA Billerica
- Assignee: Entegris, Inc.
- Current Assignee: Entegris, Inc.
- Current Assignee Address: US MA Billerica
- Agent John E. Pillion
- Main IPC: B01D53/22
- IPC: B01D53/22 ; B01D39/20 ; B01D46/10

Abstract:
An apparatus and method for maintaining low gas velocity variation across a diffuser membrane during the vent-up of a vacuum chamber is disclosed. The diffuser membrane permeability and the pressure conditions across the membrane are chosen to minimize variation in gas flow velocity through the membrane during the vent-up cycle. This reduces re-distribution of particles from a vacuum chamber onto sensitive substrates in the vacuum chamber during vent-up from sub-atmospheric pressure to atmospheric pressure.
Public/Granted literature
- US20090183630A1 APPARATUS AND METHOD FOR REDUCING PARTICLE CONTAMINATION IN A VACUUM CHAMBER Public/Granted day:2009-07-23
Information query
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