Invention Grant
- Patent Title: Method of manufacturing chromium plated article and chromium plating apparatus
- Patent Title (中): 镀铬制品和镀铬装置的制造方法
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Application No.: US12724783Application Date: 2010-03-16
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Publication No.: US08173004B2Publication Date: 2012-05-08
- Inventor: Takahisa Hirasawa , Hiroshi Yoshikura , Junichi Ikeda , Tsuyoshi Kawase , Yuichi Kobayashi
- Applicant: Takahisa Hirasawa , Hiroshi Yoshikura , Junichi Ikeda , Tsuyoshi Kawase , Yuichi Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Main IPC: C25D5/18
- IPC: C25D5/18

Abstract:
A pulse current from a pulse current supply side is fed to a middle part of an anode holding body to which anodes are connected; both end portions of a cathode holding body, to which cathodes are connected, are connected to a negative pole on the pulse power source side; and inductances of wiring between adjacent anodes and inductances of wiring between adjacent cathodes are set at a ratio of 1:2:3:4 in a direction of spacing from a connection to the pulse power source side. Pulse currents are equally fed to each work and it can be ensured that chromium plating treatment of each work is made equal.
Public/Granted literature
- US20100213072A1 METHOD OF MANUFACTURING CHROMIUM PLATED ARTICLE AND CHROMIUM PLATING APPARATUS Public/Granted day:2010-08-26
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