Invention Grant
- Patent Title: Manufacturing method of a nano filter structure for breathing
- Patent Title (中): 用于呼吸的纳米过滤器结构的制造方法
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Application No.: US13316244Application Date: 2011-12-09
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Publication No.: US08173033B2Publication Date: 2012-05-08
- Inventor: Shu-Yuan Chuang
- Applicant: Shu-Yuan Chuang
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Main IPC: B23P15/00
- IPC: B23P15/00 ; C03C25/00 ; C23F1/00 ; B01D50/00

Abstract:
In a nano filter structure for breathing and a manufacturing method of the nano filter structure, a semiconductor process technology is used for manufacturing a nano filter structure comprising a top gate, a bottom gate, a plurality of sidewall gates and a plurality of supports. The sidewall gates include a plurality of filterable gratings, and the filterable gratings are controlled precisely to a nanoscale by a semiconductor process technology. Therefore, the nano filterable gratings can be manufactured easily and quickly, and the multilayer design of the filterable gratings enhances the aperture ratio of a filter material, such that users can inhale or exhale easily through the filter material.
Public/Granted literature
- US20120080405A1 MANUFACTURING METHOD OF A NANO FILTER STRUCTURE FOR BREATHING Public/Granted day:2012-04-05
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