Invention Grant
- Patent Title: Pattern transfer method
- Patent Title (中): 模式转移方式
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Application No.: US12730649Application Date: 2010-03-24
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Publication No.: US08173061B2Publication Date: 2012-05-08
- Inventor: Masahiro Kanno
- Applicant: Masahiro Kanno
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2009-104503 20090422
- Main IPC: B29C43/36
- IPC: B29C43/36

Abstract:
A pattern transfer method for filling a surface on a template having a concave-convex pattern with a resist material has contacting the template with the resist material applied on a substrate, curing the resist material while contacting the template with the resist, electrically charging the template and the resist with an identical polarity, and removing the template from the resist material while eclectically charging the template and the resist with an identical polarity.
Public/Granted literature
- US20100270711A1 PATTERN TRANSFER METHOD Public/Granted day:2010-10-28
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