Invention Grant
US08173092B2 Regularly arranged nanoparticulate silica and process for producing the same
有权
定期排列的纳米微粒二氧化硅及其制备方法
- Patent Title: Regularly arranged nanoparticulate silica and process for producing the same
- Patent Title (中): 定期排列的纳米微粒二氧化硅及其制备方法
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Application No.: US11886216Application Date: 2006-03-10
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Publication No.: US08173092B2Publication Date: 2012-05-08
- Inventor: Takashi Tatsumi , Toshiyuki Yokoi
- Applicant: Takashi Tatsumi , Toshiyuki Yokoi
- Applicant Address: JP Saitama
- Assignee: Japan Science and Technology Agency
- Current Assignee: Japan Science and Technology Agency
- Current Assignee Address: JP Saitama
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless; Christine C. O'Day
- Priority: JP2005-067665 20050310
- International Application: PCT/JP2006/304696 WO 20060310
- International Announcement: WO2006/095845 WO 20060914
- Main IPC: C01B33/021
- IPC: C01B33/021 ; C01B33/12

Abstract:
A novel silica which is in the form of ultrafine particles having mesopores and has a regular structure; and a process for producing the silica. The silica is a self-organized nanoparticulate silica characterized in that the average particle diameter is 4 to 30 nm, preferably 6 to 20 nm, and these particles are regularly arranged so as to form a primitive cubic lattice. The self-organized nanoparticulate silica is produced by mixing an alkoxysilane with an aqueous solution of a basic amino acid, reacting the mixture at 40 to 100° C., and subjecting the reaction mixture to drying and preferably to subsequent burning. Also provided is a process for producing fine silica particles having a particle diameter of 4 to 30 nm, which comprises mixing a solution of an alkoxysilane compound having 1 to 4 alkoxy groups with a solution of a basic amino acid and reacting the mixture at 20 to 100° C. to cause hydrolysis and condensation polymerization.
Public/Granted literature
- US20080311397A1 Regularly Arranged Nanoparticulate Silica and Process for Producing the Same Public/Granted day:2008-12-18
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