Invention Grant
- Patent Title: PVD coated substrate
- Patent Title (中): PVD涂层基材
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Application No.: US11912549Application Date: 2006-04-25
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Publication No.: US08173248B2Publication Date: 2012-05-08
- Inventor: Papken Hovsepian , Arutiun P. Ehiasarian
- Applicant: Papken Hovsepian , Arutiun P. Ehiasarian
- Applicant Address: GB
- Assignee: Sheffield Hallam University
- Current Assignee: Sheffield Hallam University
- Current Assignee Address: GB
- Agency: Clark Hill PLC
- Priority: GB0508485.0 20050427
- International Application: PCT/GB2006/001509 WO 20060425
- International Announcement: WO2006/114610 WO 20061102
- Main IPC: B32B9/00
- IPC: B32B9/00 ; C23C28/02
Abstract:
A PVD coating is disclosed, and in particular a nanoscale multilayer superlattice PVD coating comprising high hardness, a low friction coefficient and increased chemical inertness. The multilayer coating comprises a repeating bilayer represented by (VxMe(i-x))CyN(i-y)/(MezV(1-z))CyN(i-y) where 0.1≦x≦0.9; 0.01
Public/Granted literature
- US20080260478A1 Pvd Coated Substrate Public/Granted day:2008-10-23
Information query
