Invention Grant
US08173331B2 Method and apparatus for sub-pellicle defect reduction on photomasks
有权
在光掩模上进行亚防护薄膜缺陷减少的方法和装置
- Patent Title: Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent Title (中): 在光掩模上进行亚防护薄膜缺陷减少的方法和装置
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Application No.: US12685491Application Date: 2010-01-11
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Publication No.: US08173331B2Publication Date: 2012-05-08
- Inventor: Jay S. Burnham , Frances A. Houle , Louis M. Kindt
- Applicant: Jay S. Burnham , Frances A. Houle , Louis M. Kindt
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a pattern is formed, the substrate having a frontside and an opposite backside, and a protective coating formed on at least one of the frontside and the backside, the protective coating comprising silicon-based compound.
Public/Granted literature
- US20100178598A1 METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS Public/Granted day:2010-07-15
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