Invention Grant
- Patent Title: Beam ablation lithography
- Patent Title (中): 光束消融光刻
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Application No.: US12373607Application Date: 2007-07-13
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Publication No.: US08173335B2Publication Date: 2012-05-08
- Inventor: Marija Drndic , Michael D Fischbein
- Applicant: Marija Drndic , Michael D Fischbein
- Applicant Address: US PA Philadelphia
- Assignee: The Trustees of the University of Pennsylvania
- Current Assignee: The Trustees of the University of Pennsylvania
- Current Assignee Address: US PA Philadelphia
- Agency: Woodcock Washburn LLP
- International Application: PCT/US2007/016006 WO 20070713
- International Announcement: WO2008/010959 WO 20080124
- Main IPC: G03C5/00
- IPC: G03C5/00
Abstract:
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires, nano-crystals and artificial atoms made using the disclosed methods.
Public/Granted literature
- US20100009134A1 BEAM ABLATION LITHOGRAPHY Public/Granted day:2010-01-14
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