Invention Grant
US08173336B2 Circuit pattern formation device and method of forming circuit pattern
有权
电路图形形成装置及其形成电路图案的方法
- Patent Title: Circuit pattern formation device and method of forming circuit pattern
- Patent Title (中): 电路图形形成装置及其形成电路图案的方法
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Application No.: US11829137Application Date: 2007-07-27
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Publication No.: US08173336B2Publication Date: 2012-05-08
- Inventor: Yuichiro Sano , Toru Miyasaka
- Applicant: Yuichiro Sano , Toru Miyasaka
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2006-204070 20060727
- Main IPC: G03G21/00
- IPC: G03G21/00

Abstract:
The purpose of the present invention is to provide a method for transferring a pattern of a circuit pattern precursor formed of electroconductive particles containing no resin component onto an objective substrate with high transfer efficiency while retaining a pattern shape. A method of transferring the circuit pattern precursor formed from an conductive particle dispersed solution on a dielectric thin film body includes the steps of: temporarily removing a liquid film remaining around the circuit pattern precursor right after a development step; subsequently re-electrifying the electroconductive particle pattern by supplying a solvent again to the circuit pattern precursor; and then electrostatically transferring the pattern onto the objective substrate through electrophoresis in the solvent.
Public/Granted literature
- US20080026307A1 CIRCUIT PATTERN FORMATION DEVICE AND METHOD OF FORMING CIRCUIT PATTERN Public/Granted day:2008-01-31
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