Invention Grant
- Patent Title: Micropatterning of molecular surfaces via selective irradiation
- Patent Title (中): 通过选择性辐射微分谱分子表面
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Application No.: US11201915Application Date: 2005-08-11
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Publication No.: US08173347B2Publication Date: 2012-05-08
- Inventor: Jeffrey T. Koberstein , Feng Pan , Kwangjoo Lee , Peng Wang
- Applicant: Jeffrey T. Koberstein , Feng Pan , Kwangjoo Lee , Peng Wang
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Wilmer Cutler Pickering Hale and Dorr LLP
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.
Public/Granted literature
- US20060165912A1 Micropatterning of molecular surfaces via selective irradiation Public/Granted day:2006-07-27
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