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US08173347B2 Micropatterning of molecular surfaces via selective irradiation 有权
通过选择性辐射微分谱分子表面

Micropatterning of molecular surfaces via selective irradiation
Abstract:
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.
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