Invention Grant
- Patent Title: Resist composition
- Patent Title (中): 抗蚀组成
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Application No.: US12627683Application Date: 2009-11-30
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Publication No.: US08173352B2Publication Date: 2012-05-08
- Inventor: Nobuo Ando
- Applicant: Nobuo Ando
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-307648 20081202
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
A resist composition comprising: (A) a resin comprising a structural unit having an acid-labile group in its side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, Z1 represents a single bond or —(CH2)k—CO—O—, k represents an integer of 1 to 4, and ring X represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO—, (B) a resin comprising a structural unit having an acid-labile group in its side chain and a structural unit represented by the formula (III): wherein R6 represents a hydrogen atom or a methyl group, R7 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4, and (C) an acid generator.
Public/Granted literature
- US20100136481A1 RESIST COMPOSITION Public/Granted day:2010-06-03
Information query
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