Invention Grant
- Patent Title: Fabrication method of light emitting device
- Patent Title (中): 发光装置的制造方法
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Application No.: US13050201Application Date: 2011-03-17
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Publication No.: US08173469B2Publication Date: 2012-05-08
- Inventor: Kyung Wook Park , Myung Hoon Jung
- Applicant: Kyung Wook Park , Myung Hoon Jung
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: KED & Associates LLP
- Priority: KR10-2010-0024087 20100318
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided is a method for fabricating a light emitting device. The method for fabricating the light emitting device includes forming a buffer layer including a compound semiconductor in which a rare-earth element is doped on a substrate, forming a light emitting structure including a first conductive type semiconductor layer, an active layer, and a second conductive type semiconductor layer, which are successively stacked on the buffer layer, forming a first electrode layer on the light emitting structure, removing the substrate, and forming a second electrode layer under the light emitting structure.
Public/Granted literature
- US20110229999A1 FABRICATION METHOD OF LIGHT EMITTING DEVICE Public/Granted day:2011-09-22
Information query
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