Invention Grant
US08173475B2 Method of producing photoelectric conversion device having a multilayer structure formed on a substrate
有权
一种制造具有形成在基板上的多层结构的光电转换装置的方法
- Patent Title: Method of producing photoelectric conversion device having a multilayer structure formed on a substrate
- Patent Title (中): 一种制造具有形成在基板上的多层结构的光电转换装置的方法
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Application No.: US13011584Application Date: 2011-01-21
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Publication No.: US08173475B2Publication Date: 2012-05-08
- Inventor: Tetsuo Kawano , Takashi Koike
- Applicant: Tetsuo Kawano , Takashi Koike
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-017657 20100129
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of producing a photoelectric conversion device having a multilayer structure formed on a substrate, the multilayer structure including a lower electrode, a photoelectric conversion layer made of a compound semiconductor layer, an n-type buffer layer made of a compound semiconductor layer, and a transparent conductive layer, is disclosed. A reaction solution, which is an aqueous solution containing an n-type dopant element, at least one of ammonia and an ammonium salt, and thiourea, is prepared, the n-type dopant is diffused into the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer in the reaction solution controlled to a temperature in the range from 20° C. to 45° C.; and the buffer layer is deposited on the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer subjected to the diffusion step in the reaction solution controlled to a temperature in the range from 70° C. to 95° C.
Public/Granted literature
- US20110189816A1 METHOD OF PRODUCING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2011-08-04
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