Invention Grant
US08173546B2 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
有权
蚀刻剂组合物，图案化导电层和制造平板，使用其的显示装置
- Patent Title: Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
- Patent Title (中): 蚀刻剂组合物，图案化导电层和制造平板，使用其的显示装置
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Application No.: US13167587Application Date: 2011-06-23
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Publication No.: US08173546B2Publication Date: 2012-05-08
- Inventor: Bong-Kyun Kim , Hong-Sick Park , Jong-Hyun Choung , Sun-Young Hong , Ji-Sun Lee , Byeong-Jin Lee , Kui-Jong Baek , Tai-Hyung Rhee , Yong-Sung Song
- Applicant: Bong-Kyun Kim , Hong-Sick Park , Jong-Hyun Choung , Sun-Young Hong , Ji-Sun Lee , Byeong-Jin Lee , Kui-Jong Baek , Tai-Hyung Rhee , Yong-Sung Song
- Applicant Address: KR KR
- Assignee: Samsung Electronics Co., Ltd.,Techno Semichem Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.,Techno Semichem Co., Ltd.
- Current Assignee Address: KR KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2008-20352 20080305
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.
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