Invention Grant
US08173740B2 Styrene tetrablock copolymers and polymer blend compositions based upon such copolymers
有权
基于这些共聚物的苯乙烯四嵌段共聚物和聚合物共混组合物
- Patent Title: Styrene tetrablock copolymers and polymer blend compositions based upon such copolymers
- Patent Title (中): 基于这些共聚物的苯乙烯四嵌段共聚物和聚合物共混组合物
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Application No.: US12514744Application Date: 2007-10-24
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Publication No.: US08173740B2Publication Date: 2012-05-08
- Inventor: Andre J. Uzee , Michael O. Myers
- Applicant: Andre J. Uzee , Michael O. Myers
- Applicant Address: US DE Country of New Castle, Wilmington
- Assignee: TSRC (USA) Investment Corporation
- Current Assignee: TSRC (USA) Investment Corporation
- Current Assignee Address: US DE Country of New Castle, Wilmington
- Agency: Snell & Wilmer L.L.P.
- International Application: PCT/US2007/082389 WO 20071024
- International Announcement: WO2008/063807 WO 20080529
- Main IPC: C08L53/00
- IPC: C08L53/00

Abstract:
A composition of matter that may be used to make transparent, substantially gel-free polymeric films includes at least a styrenic block copolymer and a thermoplastic resin other than the styrenic block copolymer. The styrenic block copolymer (e.g. S-I-B-S) has four distinct and sequential blocks: a first styrenic block (S), a first diene block (e.g. isoprene or I), a second diene block that differs from the first diene block (e.g. butadiene or B) and a second styrenic block (S). The styrenic block copolymer desirably lacks any random diene block (e.g. a random isoprene/butadiene block). The styrenic block copolymer also desirably lacks any significant percentage of a triblock copolymer (S-I-B). The composition of matter may also include an extender material such as white mineral oil. The compositions may be used to make mono-layer or multi-layer cast or blown films.
Public/Granted literature
- US20100056697A1 STYRENE TETRABLOCK COPOLYMERS AND POLYMER BLEND COMPOSITIONS BASED UPON SUCH COPOLYMERS Public/Granted day:2010-03-04
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