Invention Grant
- Patent Title: Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
- Patent Title (中): 用于在产生短波辐射期间除去由辐射源产生的颗粒的方法和装置
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Application No.: US10599345Application Date: 2005-03-18
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Publication No.: US08173975B2Publication Date: 2012-05-08
- Inventor: Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- Applicant: Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP04101311 20040331
- International Application: PCT/IB2005/050941 WO 20050318
- International Announcement: WO2005/096099 WO 20051013
- Main IPC: G21K5/00
- IPC: G21K5/00

Abstract:
A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.
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