An ion processing apparatus includes a plurality of electrodes, first and second insulators, a housing, and a plurality of compliant first supports and second supports. Each electrode has a length along a central axis, and includes a first end region and an axially opposing second end region. The first and second insulators are coaxially disposed about the first and second end regions, respectively. The housing is coaxially disposed about the electrodes, the first insulator and the second insulator. The first supports extend between, and into contact with, the first insulator and the housing. The second supports extend between, and into contact with, the second insulator and the housing. The supports isolate the electrodes from external forces.