Invention Grant
- Patent Title: Generating and visualizing an ion beam profile
- Patent Title (中): 产生和可视化离子束分布
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Application No.: US12333741Application Date: 2008-12-12
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Publication No.: US08173979B2Publication Date: 2012-05-08
- Inventor: Shettihalli Murali
- Applicant: Shettihalli Murali
- Applicant Address: DE Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Munich
- Agency: Lempia Summerfield Katz LLC
- Priority: EP08002307 20080207
- Main IPC: A61N5/00
- IPC: A61N5/00 ; A61N5/10

Abstract:
A method for generating and visualizing an ion beam profile is provided. The method includes specifying an incidence direction of a particle beam, specifying a target region that is to be irradiated by said particle beam, creating an ion beam profile from points that are located on a downstream side of the target region or that are located in front of the target region and project onto the contour of the target region with respect to the incidence direction, and displaying a graphical representation of the ion beam profile.
Public/Granted literature
- US20090200490A1 GENERATING AND VISUALIZING AN ION BEAM PROFILE Public/Granted day:2009-08-13
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