Invention Grant
- Patent Title: Apparatus and method of manufacture for depositing a composite anti-reflection layer on a silicon surface
- Patent Title (中): 用于在硅表面上沉积复合抗反射层的装置和方法
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Application No.: US12632583Application Date: 2009-12-07
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Publication No.: US08174014B2Publication Date: 2012-05-08
- Inventor: Bedabrata Pain
- Applicant: Bedabrata Pain
- Applicant Address: US CA Pasadena
- Assignee: California Institute of Technology
- Current Assignee: California Institute of Technology
- Current Assignee Address: US CA Pasadena
- Agency: Zilka-Kotab, PC
- Main IPC: H01L29/04
- IPC: H01L29/04
Abstract:
An apparatus and associated method are provided. A first silicon layer having at least one of an associated passivation layer and barrier is included. Also included is a composite anti-reflection layer including a stack of layers each with a different thickness and refractive index. Such composite anti-reflection layer is disposed adjacent to the first silicon layer.
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