Invention Grant
- Patent Title: Gallium nitride device with a diamond layer
- Patent Title (中): 具有金刚石层的氮化镓装置
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Application No.: US13157653Application Date: 2011-06-10
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Publication No.: US08174024B2Publication Date: 2012-05-08
- Inventor: Ralph Korenstein , Steven D. Bernstein , Stephen J. Pereira
- Applicant: Ralph Korenstein , Steven D. Bernstein , Stephen J. Pereira
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: H01L31/0312
- IPC: H01L31/0312

Abstract:
In one aspect, a device includes a gallium nitride (GaN) layer, a first diamond layer disposed on the GaN layer, a gate structure disposed in contact with the GaN layer and the first diamond layer, and a second diamond layer having a first thermal conductivity and disposed on a second surface of the GaN layer. The gate and the first diamond layer are disposed on a first surface of the GaN layer opposite the second surface of the GaN layer.
Public/Granted literature
- US20110241018A1 FABRICATING A GALLIUM NITRIDE DEVICE WITH A DIAMOND LAYER Public/Granted day:2011-10-06
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