Invention Grant
US08174046B1 Reducing effects of parasitic transistors in thyristor-based memory using local thinning or implanting
失效
使用局部变薄或植入,减少寄生晶体管在基于晶闸管的存储器中的影响
- Patent Title: Reducing effects of parasitic transistors in thyristor-based memory using local thinning or implanting
- Patent Title (中): 使用局部变薄或植入,减少寄生晶体管在基于晶闸管的存储器中的影响
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Application No.: US11362285Application Date: 2006-02-23
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Publication No.: US08174046B1Publication Date: 2012-05-08
- Inventor: Marc Laurent Tarabbia , Maxim Ershov , Rajesh N. Gupta
- Applicant: Marc Laurent Tarabbia , Maxim Ershov , Rajesh N. Gupta
- Applicant Address: US CA Mountain View
- Assignee: T-RAM Semiconductor, Inc
- Current Assignee: T-RAM Semiconductor, Inc
- Current Assignee Address: US CA Mountain View
- Agency: The Webostad Firm
- Main IPC: H01L29/74
- IPC: H01L29/74

Abstract:
Method and apparatus for an integrated circuit having memory including thyristor-based memory cells is described. A pair of the thyristor-based memory cells are commonly coupled via a bitline region, where a parasitic bipolar junction transistor is defined therebetween responsive to the bitline region being common. In another implementation, the pair of the thyristor-based memory cells are commonly coupled via the anode region, where a parasitic bipolar junction transistor is defined therebetween responsive to the anode region being common. The common bitline or anode region, respectively, has a locally thinned region to inhibit charge transfer between the pair via the parasitic bipolar junction transistor. Moreover, a method for forming a field-effect transistor on a silicon-on-insulator wafer is described, where charge transfer facilitated by a parasitic bipolar transistor is reduced responsive to an increase in dopants at least proximate to an insulator layer.
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