An integrated circuit includes common gate FinFET and split gate FinFET devices formed from different height fins at a semiconductor surface of a substrate. A patterned layer of gate electrode material formed over sides and unconnected over the tops of the taller fins defines respective gate electrodes for first and second paired transistors. The patterned layer of gate electrode material formed over the sides and connected over tops of the shorter fins defines common gate electrodes for transistors. In one embodiment, the common gate devices are used for cross-coupled inverters of a memory cell core storage element and the split gate devices are used for pass gates, with the gate electrodes coupled to wordlines and common source/drains coupled to bitline/complementary bitline and core element storage/complementary storage nodes.In another embodiment, the split gate devices are used for input transistors of a differential amplifier, with one gate electrode coupled to receive an input signal and the other gate electrode coupled to receive a mismatch correction bias.