Invention Grant
- Patent Title: Electromagnectic wave detecting element
- Patent Title (中): 电磁波检测元件
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Application No.: US12320225Application Date: 2009-01-22
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Publication No.: US08174087B2Publication Date: 2012-05-08
- Inventor: Yoshihiro Okada
- Applicant: Yoshihiro Okada
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: SOLARIS Intellectual Property Group, PLLC
- Priority: JP2008-017743 20080129; JP2008-093858 20080331; JP2008-209179 20080815
- Main IPC: H01L31/06
- IPC: H01L31/06

Abstract:
The present invention is to provide an electromagnetic wave detecting element that can prevent a decrease in light utilization efficiency at sensor portions. The sensor portions are provided so as to correspond to respective intersection portions of scan lines and signal lines, and have semiconductor layer that generate charges due to electromagnetic waves being irradiated, and at whose electromagnetic wave irradiation surface sides upper electrodes are formed, and at whose electromagnetic wave non-irradiation surface sides lower electrodes are formed. Bias voltage is supplied to the respective upper electrodes via respective contact holes by a common electrode line that is formed further toward an electromagnetic wave downstream side than the semiconductor layer.
Public/Granted literature
- US20090189231A1 Electromagnectic wave detecting element Public/Granted day:2009-07-30
Information query
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